endura® cl system (Applied Materials Inc)

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Applied Materials Inc endura® cl system
Endura® Cl System, supplied by Applied Materials Inc, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/product/endura%C2%AE+cl+system/endura++cl+system/us12198908-55-11-16
Average 90 stars, based on 1 article reviews

endura® cl system - by Bioz Stars, 2026-09

90/100 stars

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Article Title: Hydrogenation and nitridization processes for reducing oxygen content in a film
Article Snippet: One example of a suitable multi-chamber processing system 500 is the Endura® CL System manufactured by Applied Materials, Inc. of Santa Clara, Calif. Another example of a suitable multi-chamber processing system 500 is the Centura® System, also manufactured by Applied Materials, Inc. Each of processing chambers 514, 516, 518, 520, 522, and 524 may be configured to perform one or more process steps in the fabrication of a conductive structure in a semiconductor device, such as a contact structure for a field-effect transistor (FET).

Article Title: Modifying work function of a metal film with a plasma process
Article Snippet: One example of a suitable multi-chamber processing system 600 is the Endura® CL System manufactured by Applied Materials, Inc. of Santa Clara, Calif. Each of processing chambers 614, 616, 618, 620, 622, and 624 may be configured to perform one or more process steps in the fabrication of a conductive structure in a semiconductor device, such as a contact structure for a field-effect transistor (FET).

Article Title: Hydrogenation and nitridization processes for modifying effective oxide thickness of a film
Article Snippet: One example of a suitable multi-chamber processing system 500 is the Endura® CL System manufactured by Applied Materials, Inc. of Santa Clara, Calif. Each of processing chambers 514, 516, 518, 520, 522, and 524 may be configured to perform one or more process steps in the fabrication of a conductive structure in a semiconductor device, such as a contact structure for a field-effect transistor (FET).

Article Title: Magnetically coupled RF filter for substrate processing chambers
Article Snippet: One example of a suitable multi-chamber processing system 100 is the Endura® CL System manufactured by Applied Materials, Inc. of Santa Clara, California.

Article Title: Semiconductor wafer preheating
Article Snippet: An example of a multiple chamber semiconductor wafer processing system for performing embodiments of the processes described herein is the Endura® CL System manufactured by Applied Materials, Inc. of Santa Clara, Calif. FIG. 1 depicts a semiconductor wafer processing system 100 that is similar to an Endura® CL System, but has modified transition chambers 102 and 104 that contain heating elements 105.

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